Effect of secondary annealing on Al/Ti/n-GaN/Si ohmic contacts;
二次退火對Al/Ti/n-GaN/Si歐姆接觸的影響
The key of new process focuses on 2 points:one is lower cold deformation ratio and another is 2nd annealing at lower temperature(250 , 30 min).
工藝的關鍵在于在相對低的最后一次變形率(ε=30%)條件下,進行低溫二次退火(250℃/30min),用該工藝軋制所得銀帶在自然時效時力學性能十分穩定。
The measure of twice stable annealing process is discussed.
采用二次穩定化退火處理 ,解決了 Cr17Ni2鋼異質焊接接頭刀狀腐蝕的問題。